求助Japanese Journal of Applied Physics 文献一篇
【作者】Oh, Han-Seog;Lee, Hong-Lim【文题】A Comparative Study between Total Thickness Variance and Site Flatness of Polished Silicon Wafer
【期刊名，年份，卷（期），起止页码】Japanese Journal of Applied Physics 0021-4922 2001, 40 (9A), pp 5300
【全文链接或数据库名称（pubmed 点击“linkout”）】
【求助者联系方式】[email]zhgu82@gmail.com[/email]
【申请原因】 无法查到电子版 [url]http://g.zhubajie.com/urllink.php?id=2577361y269027tc6zi6he8[/url] wait renling, 楼上的来 [quote]原帖由 [i]huanghefirst[/i] 于 2008-6-18 16:04 发表 [url=http://www.chem8.org/bbs/redirect.php?goto=findpost&pid=62590&ptid=16791][img]http://www.chem8.org/bbs/images/common/back.gif[/img][/url]
wait [/quote]
sorry, I can not download it because my account is overdue 我来！！ [quote]原帖由 [i]huanghefirst[/i] 于 2008-6-18 16:10 发表 [url=http://chem8.org/bbs/redirect.php?goto=findpost&pid=62592&ptid=16791][img]http://chem8.org/bbs/images/common/back.gif[/img][/url]
sorry, I can not download it because my account is overdue [/quote]
谢谢您的关注！
页:
[1]